The purpose was to study the effects of atomic oxygen on the erosion of polymer based materials. The development of an atomic oxygen neutral beam facility using a SURFATRON surface wave launcher that can produce beam energies between 2 and 3 eV at flux levels as high as approx. 10 to the 17th power atoms/cm (2)-sec is described. Thin film dielectric materials were studied to determine recession rates and and reaction efficiencies as a function of incident beam energy and fluence. Accelerated testing was also accomplished and the values of reaction efficiency compared to available space flight data. Electron microscope photomicrographs of the samples' surface morphology were compared to flight test specimens.